KFU. Card publication. Pulsed laser annealing of high-dose Ag+-ion implanted Si layer

KAZAN
FEDERAL UNIVERSITY

- RUS
- 中文
- ES

PULSED LASER ANNEALING OF HIGH-DOSE AG+-ION IMPLANTED SI LAYER

Form of presentation

Articles in international journals and collections

Year of publication

2017

Язык

английский

Authors, employees of KFU

Osin Yuriy Nikolaevich, author

Stepanov Andrey Lvovich, author

Other authors

Batalov R. I., author

Valeev V. F., author

Ivleev G. , author

Nuzhdin V. I., author

Authors, postgraduates KFU

Vorobev Vyacheslav Valerevich, postgraduate kfu

Bibliographic description in the original language

R I Batalov Pulsed laser annealing of high-dose Ag+-ion implanted Si layer / R I Batalov, V I Nuzhdin, V F Valeev, V V Vorobev, Yu N Osin, G D Ivlev and A L Stepanov// Journal of Physics D: Applied Physics, Volume 51, Number 1, -2017

Annotation

Journal of Physics D: Applied Physics

Keywords

silicon, silver nanoparticles, ion implantation, pulsed laser annealing, melting, crystallization, plasmon resonance

The name of the journal

Journal of Physics D: Applied Physics

Please use this ID to quote from or refer to the card

https://repository.kpfu.ru/eng/?p_id=169470&p_lang=2

Full metadata record

Field DC	Value	Language
dc.contributor.author	Osin Yuriy Nikolaevich	ru_RU
dc.contributor.author	Stepanov Andrey Lvovich	ru_RU
dc.contributor.author	Batalov R. I.	ru_RU
dc.contributor.author	Valeev V. F.	ru_RU
dc.contributor.author	Ivleev G.	ru_RU
dc.contributor.author	Nuzhdin V. I.	ru_RU
dc.contributor.author	Vorobev Vyacheslav Valerevich	ru_RU
dc.date.accessioned	2017-01-01T00:00:00Z	ru_RU
dc.date.available	2017-01-01T00:00:00Z	ru_RU
dc.date.issued	2017	ru_RU
dc.identifier.citation	R I Batalov Pulsed laser annealing of high-dose Ag+-ion implanted Si layer / R I Batalov, V I Nuzhdin, V F Valeev, V V Vorobev, Yu N Osin, G D Ivlev and A L Stepanov// Journal of Physics D: Applied Physics, Volume 51, Number 1, -2017	ru_RU
dc.identifier.uri	https://repository.kpfu.ru/eng/?p_id=169470&p_lang=2	ru_RU
dc.description.abstract	Journal of Physics D: Applied Physics	ru_RU
dc.description.abstract	Journal of Physics D: Applied Physics	ru_RU
dc.language.iso	ru	ru_RU
dc.subject	silicon	ru_RU
dc.subject	silver nanoparticles	ru_RU
dc.subject	ion implantation	ru_RU
dc.subject	pulsed laser annealing	ru_RU
dc.subject	melting	ru_RU
dc.subject	crystallization	ru_RU
dc.subject	plasmon resonance	ru_RU
dc.title	Pulsed laser annealing of high-dose Ag+-ion implanted Si layer	ru_RU
dc.type	Articles in international journals and collections	ru_RU