KFU. Card publication. Pulse ion annealing of silicon layers with silver nanoparticles formed by ion implantation

KAZAN
FEDERAL UNIVERSITY

- RUS
- 中文
- ES

PULSE ION ANNEALING OF SILICON LAYERS WITH SILVER NANOPARTICLES FORMED BY ION IMPLANTATION

Form of presentation

Articles in international journals and collections

Year of publication

2020

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Authors, employees of KFU

Rogov Aleksey Mikhaylovich, author

Bibliographic description in the original language

Stepanov A.L, Batalov R.I, Bayazitov R.M, Pulse ion annealing of silicon layers with silver nanoparticles formed by ion implantation//Vacuum. - 2020. - Vol.182, Is.. - Art. � 109724.

Keywords

semiconductors, microscopy, ion implantation

The name of the journal

Vacuum

URL

https://www.scopus.com/inward/record.uri?eid=2-s2.0-85089943862&doi=10.1016%2fj.vacuum.2020.109724&partnerID=40&md5=78e3028b2e3eaaadab97e497eae13dca

Please use this ID to quote from or refer to the card

https://repository.kpfu.ru/eng/?p_id=242465&p_lang=2

Full metadata record

Field DC	Value	Language
dc.contributor.author	Rogov Aleksey Mikhaylovich	ru_RU
dc.date.accessioned	2020-01-01T00:00:00Z	ru_RU
dc.date.available	2020-01-01T00:00:00Z	ru_RU
dc.date.issued	2020	ru_RU
dc.identifier.citation	Stepanov A.L, Batalov R.I, Bayazitov R.M, Pulse ion annealing of silicon layers with silver nanoparticles formed by ion implantation//Vacuum. - 2020. - Vol.182, Is.. - Art. � 109724.	ru_RU
dc.identifier.uri	https://repository.kpfu.ru/eng/?p_id=242465&p_lang=2	ru_RU
dc.description.abstract	Vacuum	ru_RU
dc.language.iso	ru	ru_RU
dc.subject	semiconductors	ru_RU
dc.subject	microscopy	ru_RU
dc.subject	ion implantation	ru_RU
dc.title	Pulse ion annealing of silicon layers with silver nanoparticles formed by ion implantation	ru_RU
dc.type	Articles in international journals and collections	ru_RU